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The equation for calculating the ionized impurity concentration in a semiconductor material is given by the equation:

ni2=NdNaexp⁡(EikT)n_i^2 = N_dN_aexpleft(frac{E_i}{kT} ight)

where:

  • nin_i is the intrinsic carrier concentration
  • NdN_d is the concentration of donor impurities (usually in the form of phosphorus, arsenic, or other elements that donate an extra electron to the material)
  • NaN_a is the concentration of acceptor impurities (usually in the form of boron, gallium, or other elements that create a "hole" in the material)
  • EiE_i is the intrinsic energy level (also known as the intrinsic Fermi level) in electron volts (eV)
  • kk is Boltzmann's constant (8.617333262145×10−58.617333262145 imes 10^{ -5} eV/K)
  • TT is the temperature in Kelvin (K)

This equation relates the impurity concentrations to

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