The equation for calculating the ionized impurity concentration in a semiconductor material is given by the equation:
ni2=NdNaexp(EikT)n_i^2 = N_dN_aexpleft(frac{E_i}{kT}
ight)ni2=NdNaexp(kTEi)
where:
- nin_ini is the intrinsic carrier concentration
- NdN_dNd is the concentration of donor impurities (usually in the form of phosphorus, arsenic, or other elements that donate an extra electron to the material)
- NaN_aNa is the concentration of acceptor impurities (usually in the form of boron, gallium, or other elements that create a "hole" in the material)
- EiE_iEi is the intrinsic energy level (also known as the intrinsic Fermi level) in electron volts (eV)
- kkk is Boltzmann's constant (8.617333262145×10−58.617333262145 imes 10^{ -5}8.617333262145×10−5 eV/K)
- TTT is the temperature in Kelvin (K)
This equation relates the impurity concentrations to